M.Sc. DEGREE EXAMINATION, APRIL 2016
Second Semester
Nanoscience and Technology
THIN FILM TECHNOLOGIES AND CHARACTERISTICS
(CBCS 2013 onwards)
Time 3 Hours Maximum 75 Marks
Part A (10 2 20)
Answer all questions.
1. Define strike process.
2. What is meant by electroless plating?
3. Define vacuum.
4. What is meant by 'cold
5. Write the texturing of thin film.
6. What is meant by nucleation process?
7. Define epitaxy.
8. What is diffusion?
9. How can we calculate thickness of thin films?
10. Give any two applications of thin films.
Sub. Code
533501
RW-10855
2
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Part B 5 25)
Answer all questions choosing either or
11. Classify vacuum with relation to pressure.
Or
Explain any one of the sputtering techniques in
briefly.
12. Give a short note on rotary oil pump.
Or
Write the working principle of turbo molecular
pump in briefly.
13. Write a short note on composition control and
growth monitoring in thin film growth.
Or
Explain the effect of lattice mismatch on surface
morphology of thin films.
14. Distinguish between liquid phase epitaxy and vapor
phase epitaxy.
Or
Write a brief note on atomic layer deposition.
15. Explain in briefly on mechanical properties of thin
films.
Or
Give an account on multilayer thin films.
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Part C 10 30)
Answer any three questions.
16. Discuss any two CVD techniques in detail.
17. Describe in detail on cryo pump and sputter-ion pimp.
18. Explain about deposition techniques in semiconductor
substrates.
19. Explain the basic principle of MOCVD with suitable
reaction mechanisms.
20. Discuss in detail on characteristics of thin films.